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    [原創(chuàng)]TracePro中的重點(diǎn)采樣 [復(fù)制鏈接]

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    離線hytt
     
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    只看樓主 倒序閱讀 樓主  發(fā)表于: 2018-01-28
    關(guān)鍵詞: Tracepro重點(diǎn)采樣
    學(xué)了TracePro有一段時(shí)間了,一直沒有注意到重點(diǎn)采樣這個(gè)功能,后來分析問題的時(shí)候發(fā)現(xiàn)光線追跡的時(shí)間會因?yàn)楣饩數(shù)太多會達(dá)到30分鐘甚至更多時(shí)間。了解有重點(diǎn)采樣這個(gè)東西后,我直覺就是可以解決用相對較少的光線數(shù)來解決問題(直覺不科學(xué),哈),所以就開始摸索。下面分享一下我的經(jīng)驗(yàn),我也有許多不會的,歡迎大家參加討論。   RFG$X-.e  
      
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    重點(diǎn)采樣在User's Manual里面的描述是: @5}gsC  
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    Importance sampling is a Monte Carlo technique in which rays are generated and propagated in specific directions in the optical system, which are “important” in determining the results you need. This improves sampling by increasing the number of rays reaching the surface or surfaces of interest to the user. Importance sampling is essential in a stray light analysis, where the attenuation of incident light can be very great, and can be helpful in other types of analyses. In a stray light analysis, there should be an importance sampling target for each optical surface in the optical system. It is important to remember that importance sampling is used only to enhance the sampling of scattered and diffracted light or surface sources. Designs that include only specular reflection and transmission cannot take advantage of importance sampling — the direction of the rays is determined by the Law of Reflection and Snell’s Law. dA#{Cn;  
    Figure 7.1 on page 7.3 illustrates importance sampling for the simple case of a lens that scatters from its second surface. A second object is shown that corresponds to a detector. In this case rays from an off-axis field position are imaged such that all of the specular rays miss the detector. Generally, scattering is stronger close to the specular direction of the un-scattered ray so the probability of a randomly scattered ray hitting the detector is very small. When an importance target is applied, it guarantees that the one or more importance rays will hit the detector for each incident ray.
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    r7)@M%A  
    自己嘗試翻譯一下為: ;WI]vn  
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    重點(diǎn)采樣是一種Monte Carlo技術(shù),光線在光學(xué)系統(tǒng)里是按照特定的方向產(chǎn)生及傳播的,這些方向在決定你需要的分析結(jié)果上面是非常重要的。重點(diǎn)采樣通過增加到達(dá)用戶感興趣的表面的光線數(shù)來提高采樣。重點(diǎn)采樣在雜散光分析里是必要的,因?yàn)槿肷涔獾乃p可能很大,當(dāng)然在其他的分析力也是很有用的。在雜散光分析里應(yīng)該為光學(xué)系統(tǒng)里的每一個(gè)光學(xué)表面設(shè)定重點(diǎn)采樣目標(biāo)(improtant sampling target)。 )45_]tk >  
    要記住重點(diǎn)采樣僅用來增強(qiáng)散射光,衍射光或者是表面光源的采樣。在僅有鏡面反射及透射的設(shè)計(jì)里不能利用重點(diǎn)采樣,因?yàn)楣饩的傳播的方向受反射定律及折射定律決定。 &P n]  
    在7.3頁的圖7.1展示的是對在它自己的第二個(gè)表面散射的鏡頭的重點(diǎn)采樣的簡單例子。第二個(gè)物體是相對應(yīng)的探測器在這個(gè)例子里,遠(yuǎn)離光軸的光纖成像以至于所有的鏡面反射光都沒有到達(dá)探測面。通常來說在靠近 沒有散射的光線的 反射方向上散射會更強(qiáng)一點(diǎn),所以隨機(jī)散射的光到達(dá)探測器的可能性就很小。一旦我們應(yīng)用了重點(diǎn)采樣目標(biāo),對于每一個(gè)入射光會有更多的重點(diǎn)采樣光線到達(dá)探測器。
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    f:%SW  
    我們等會要做的就是上面提到的圖7.1
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    H(\V+@~>AD  
     ]R Mb,hJ  
    ok,我們開始。
    mTEVFm  
    建立一個(gè)長方體(10x10x1 mm),0面設(shè)置表面光源參數(shù)如圖
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    / = ^L iP  
    前面再放置一個(gè)簡單的透鏡如圖
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